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Schottky Barrier Height and Image Force Lowering in Monolayer MoS(2) Field Effect Transistors

Understanding the nature of the barrier height in a two-dimensional semiconductor/metal interface is an important step for embedding layered materials in future electronic devices. We present direct measurement of the Schottky barrier height and its lowering in the transition metal dichalcogenide (T...

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Foilsithe in:Nanomaterials (Basel)
Main Authors: Vaknin, Yonatan, Dagan, Ronen, Rosenwaks, Yossi
Formáid: Artigo
Teanga:Inglês
Foilsithe: MDPI 2020
Ábhair:
Rochtain Ar Líne:https://ncbi.nlm.nih.gov/pmc/articles/PMC7761329/
https://ncbi.nlm.nih.gov/pubmed/33255993
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10122346
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