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Schottky Barrier Height and Image Force Lowering in Monolayer MoS(2) Field Effect Transistors

Understanding the nature of the barrier height in a two-dimensional semiconductor/metal interface is an important step for embedding layered materials in future electronic devices. We present direct measurement of the Schottky barrier height and its lowering in the transition metal dichalcogenide (T...

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Detalhes bibliográficos
Publicado no:Nanomaterials (Basel)
Main Authors: Vaknin, Yonatan, Dagan, Ronen, Rosenwaks, Yossi
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2020
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7761329/
https://ncbi.nlm.nih.gov/pubmed/33255993
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10122346
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