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Area-Selective Atomic Layer Deposition of SiO(2) Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
[Image: see text] Area-selective atomic layer deposition (ALD) is rapidly gaining interest because of its potential application in self-aligned fabrication schemes for next-generation nanoelectronics. Here, we introduce an approach for area-selective ALD that relies on the use of chemoselective inhi...
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| Publicado no: | ACS Nano |
|---|---|
| Main Authors: | , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
American
Chemical Society
2017
|
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5665545/ https://ncbi.nlm.nih.gov/pubmed/28850774 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsnano.7b04701 |
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