Area-Selective Atomic Layer Deposition of In(2)O(3):H Using a μ-Plasma Printer for Local Area Activation

Lignende værker

• Area-Selective Atomic Layer Deposition of SiO(2) Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
  af: Mameli, Alfredo, et al.
  Udgivet: (2017)
• From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity†
  af: Mackus, Adriaan J. M., et al.
  Udgivet: (2018)
• Area-Selective Atomic Layer Deposition of Two-Dimensional WS(2) Nanolayers
  af: Balasubramanyam, Shashank, et al.
  Udgivet: (2020)
• Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O(2) Plasma
  af: Mameli, A., et al.
  Udgivet: (2018)
• Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO(2) as an Electron Transport Layer in Planar Perovskite Solar Cells
  af: Kuang, Yinghuan, et al.
  Udgivet: (2018)