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Uniform Atomic Layer Deposition of Al(2)O(3) on Graphene by Reversible Hydrogen Plasma Functionalization
[Image: see text] A novel method to form ultrathin, uniform Al(2)O(3) layers on graphene using reversible hydrogen plasma functionalization followed by atomic layer deposition (ALD) is presented. ALD on pristine graphene is known to be a challenge due to the absence of dangling bonds, leading to non...
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| Publicado no: | Chem Mater |
|---|---|
| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
American Chemical
Society
2017
|
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5384478/ https://ncbi.nlm.nih.gov/pubmed/28405059 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.chemmater.6b04368 |
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