The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

The aluminum oxide (Al(2)O(3)) thin films with various thicknesses under 50 nm were deposited by atomic layer deposition (ALD) on silicon substrate. The surface topography investigated by atomic force microscopy (AFM) revealed that the samples were smooth and crack-free. The ellipsometric spectra of...

Disgrifiad llawn

Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Cyhoeddwyd yn:Nanoscale Res Lett
Prif Awduron: Wang, Zi-Yi, Zhang, Rong-Jun, Lu, Hong-Liang, Chen, Xin, Sun, Yan, Zhang, Yun, Wei, Yan-Feng, Xu, Ji-Ping, Wang, Song-You, Zheng, Yu-Xiang, Chen, Liang-Yao
Fformat: Artigo
Iaith:Inglês
Cyhoeddwyd: Springer US 2015
Pynciau:
Nano Express
Mynediad Ar-lein:https://ncbi.nlm.nih.gov/pmc/articles/PMC4384924/
https://ncbi.nlm.nih.gov/pubmed/25852343
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-015-0757-y
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