The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

The aluminum oxide (Al(2)O(3)) thin films with various thicknesses under 50 nm were deposited by atomic layer deposition (ALD) on silicon substrate. The surface topography investigated by atomic force microscopy (AFM) revealed that the samples were smooth and crack-free. The ellipsometric spectra of...

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Bibliografische gegevens
Gepubliceerd in:Nanoscale Res Lett
Hoofdauteurs: Wang, Zi-Yi, Zhang, Rong-Jun, Lu, Hong-Liang, Chen, Xin, Sun, Yan, Zhang, Yun, Wei, Yan-Feng, Xu, Ji-Ping, Wang, Song-You, Zheng, Yu-Xiang, Chen, Liang-Yao
Formaat: Artigo
Taal:Inglês
Gepubliceerd in: Springer US 2015
Onderwerpen:
Nano Express
Online toegang:https://ncbi.nlm.nih.gov/pmc/articles/PMC4384924/
https://ncbi.nlm.nih.gov/pubmed/25852343
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-015-0757-y
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