Učitavanje...
The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition
The aluminum oxide (Al(2)O(3)) thin films with various thicknesses under 50 nm were deposited by atomic layer deposition (ALD) on silicon substrate. The surface topography investigated by atomic force microscopy (AFM) revealed that the samples were smooth and crack-free. The ellipsometric spectra of...
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| Izdano u: | Nanoscale Res Lett |
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| Glavni autori: | , , , , , , , , , , |
| Format: | Artigo |
| Jezik: | Inglês |
| Izdano: |
Springer US
2015
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| Teme: | |
| Online pristup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4384924/ https://ncbi.nlm.nih.gov/pubmed/25852343 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-015-0757-y |
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