The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

The aluminum oxide (Al(2)O(3)) thin films with various thicknesses under 50 nm were deposited by atomic layer deposition (ALD) on silicon substrate. The surface topography investigated by atomic force microscopy (AFM) revealed that the samples were smooth and crack-free. The ellipsometric spectra of...

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Detalhes bibliográficos
Publicado no:Nanoscale Res Lett
Main Authors: Wang, Zi-Yi, Zhang, Rong-Jun, Lu, Hong-Liang, Chen, Xin, Sun, Yan, Zhang, Yun, Wei, Yan-Feng, Xu, Ji-Ping, Wang, Song-You, Zheng, Yu-Xiang, Chen, Liang-Yao
Formato: Artigo
Idioma:Inglês
Publicado em: Springer US 2015
Assuntos:
Nano Express
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC4384924/
https://ncbi.nlm.nih.gov/pubmed/25852343
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-015-0757-y
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