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Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition

The tuning of structural, optical, and electrical properties of Al-doped ZnO films deposited by atomic layer deposition technique is reported in this work. With the increasing Al doping level, the evolution from (002) to (100) diffraction peaks indicates the change in growth mode of ZnO films. Spect...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Veröffentlicht in:Nanoscale Res Lett
Hauptverfasser: Zhai, Chen-Hui, Zhang, Rong-Jun, Chen, Xin, Zheng, Yu-Xiang, Wang, Song-You, Liu, Juan, Dai, Ning, Chen, Liang-Yao
Format: Artigo
Sprache:Inglês
Veröffentlicht: Springer US 2016
Schlagworte:
Online Zugang:https://ncbi.nlm.nih.gov/pmc/articles/PMC5026983/
https://ncbi.nlm.nih.gov/pubmed/27639580
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1625-0
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