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Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition
The tuning of structural, optical, and electrical properties of Al-doped ZnO films deposited by atomic layer deposition technique is reported in this work. With the increasing Al doping level, the evolution from (002) to (100) diffraction peaks indicates the change in growth mode of ZnO films. Spect...
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| Veröffentlicht in: | Nanoscale Res Lett |
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| Hauptverfasser: | , , , , , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Springer US
2016
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5026983/ https://ncbi.nlm.nih.gov/pubmed/27639580 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1625-0 |
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