The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

The aluminum oxide (Al(2)O(3)) thin films with various thicknesses under 50 nm were deposited by atomic layer deposition (ALD) on silicon substrate. The surface topography investigated by atomic force microscopy (AFM) revealed that the samples were smooth and crack-free. The ellipsometric spectra of...

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Dades bibliogràfiques
Publicat a:Nanoscale Res Lett
Autors principals: Wang, Zi-Yi, Zhang, Rong-Jun, Lu, Hong-Liang, Chen, Xin, Sun, Yan, Zhang, Yun, Wei, Yan-Feng, Xu, Ji-Ping, Wang, Song-You, Zheng, Yu-Xiang, Chen, Liang-Yao
Format: Artigo
Idioma:Inglês
Publicat: Springer US 2015
Matèries:
Nano Express
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC4384924/
https://ncbi.nlm.nih.gov/pubmed/25852343
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-015-0757-y
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