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Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors
Atomic-layer-deposition (ALD) of In(2)O(3) nano-films has been investigated using cyclopentadienyl indium (InCp) and hydrogen peroxide (H(2)O(2)) as precursors. The In(2)O(3) films can be deposited preferentially at relatively low temperatures of 160–200 °C, exhibiting a stable growth rate of 1.4–1....
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| Publié dans: | Nanoscale Res Lett |
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| Auteurs principaux: | , , , , , , |
| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
Springer US
2018
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| Sujets: | |
| Accès en ligne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5760491/ https://ncbi.nlm.nih.gov/pubmed/29318402 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-017-2414-0 |
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