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Resistive switching behavior in Lu(2)O(3) thin film for advanced flexible memory applications

In this article, the resistive switching (RS) behaviors in Lu(2)O(3) thin film for advanced flexible nonvolatile memory applications are investigated. Amorphous Lu(2)O(3) thin films with a thickness of 20 nm were deposited at room temperature by radio-frequency magnetron sputtering on flexible polye...

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Autori principali: Mondal, Somnath, Her, Jim-Long, Koyama, Keiichi, Pan, Tung-Ming
Natura: Artigo
Lingua:Inglês
Pubblicazione: Springer 2014
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Accesso online:https://ncbi.nlm.nih.gov/pmc/articles/PMC3895690/
https://ncbi.nlm.nih.gov/pubmed/24387704
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-9-3
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