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Resistive switching behavior in Lu(2)O(3) thin film for advanced flexible memory applications

In this article, the resistive switching (RS) behaviors in Lu(2)O(3) thin film for advanced flexible nonvolatile memory applications are investigated. Amorphous Lu(2)O(3) thin films with a thickness of 20 nm were deposited at room temperature by radio-frequency magnetron sputtering on flexible polye...

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Autors principals: Mondal, Somnath, Her, Jim-Long, Koyama, Keiichi, Pan, Tung-Ming
Format: Artigo
Idioma:Inglês
Publicat: Springer 2014
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Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC3895690/
https://ncbi.nlm.nih.gov/pubmed/24387704
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-9-3
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