New device applications of SiGe heterostructures
SiGe heterostructure bipolar transistors are well developed and some of them are now commercially available, whilemany efforts are being paid on field-effect transistors. Extremely high mobility is demonstrated both for n- and p-channeltransistors, which is brought by strain effects, and new devices...
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| Publié dans: | Superficies y vacío |
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| Auteur principal: | |
| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
2003
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| Sujets: | |
| Accès en ligne: | https://www.redalyc.org/articulo.oa?id=94216401 |
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