A carregar...
Reaction Mechanisms during Atomic Layer Deposition of AlF(3) Using Al(CH(3))(3) and SF(6) Plasma
[Image: see text] Metal fluorides generally demonstrate a wide band gap and a low refractive index, and they are commonly employed in optics and optoelectronics. Recently, an SF(6) plasma was introduced as a novel co-reactant for the atomic layer deposition (ALD) of metal fluorides. In this work, th...
Na minha lista:
| Publicado no: | J Phys Chem C Nanomater Interfaces |
|---|---|
| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
American Chemical Society
2021
|
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8016095/ https://ncbi.nlm.nih.gov/pubmed/33815650 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.jpcc.0c10695 |
| Tags: |
Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!
|