Cita APA

Vos, M. F. J., Knoops, H. C. M., Kessels, W. M. M., & Mackus, A. J. M. (2021). Reaction Mechanisms during Atomic Layer Deposition of AlF(3) Using Al(CH(3))(3) and SF(6) Plasma. J Phys Chem C Nanomater Interfaces.

Citación estilo Chicago

Vos, Martijn F. J., Harm C. M. Knoops, Wilhelmus M. M. Kessels, y Adriaan J. M. Mackus. "Reaction Mechanisms During Atomic Layer Deposition of AlF(3) Using Al(CH(3))(3) and SF(6) Plasma." J Phys Chem C Nanomater Interfaces 2021.

Cita MLA

Vos, Martijn F. J., Harm C. M. Knoops, Wilhelmus M. M. Kessels, y Adriaan J. M. Mackus. "Reaction Mechanisms During Atomic Layer Deposition of AlF(3) Using Al(CH(3))(3) and SF(6) Plasma." J Phys Chem C Nanomater Interfaces 2021.