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Scaling behavior of nanoimprint and nanoprinting lithography for producing nanostructures of molybdenum disulfide

Top-down lithography techniques are needed for manufacturing uniform device structures based on emerging 2D-layered materials. Mechanical exfoliation approaches based on nanoimprint and nanoprint principles are capable of producing ordered arrays of multilayer transition metal dichalcogenide microst...

詳細記述

保存先:
書誌詳細
出版年:Microsyst Nanoeng
主要な著者: Chen, Mikai, Rokni, Hossein, Lu, Wei, Liang, Xiaogan
フォーマット: Artigo
言語:Inglês
出版事項: Nature Publishing Group 2017
主題:
オンライン・アクセス:https://ncbi.nlm.nih.gov/pmc/articles/PMC6444983/
https://ncbi.nlm.nih.gov/pubmed/31057879
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/micronano.2017.53
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