Chargement en cours...

Scaling behavior of nanoimprint and nanoprinting lithography for producing nanostructures of molybdenum disulfide

Top-down lithography techniques are needed for manufacturing uniform device structures based on emerging 2D-layered materials. Mechanical exfoliation approaches based on nanoimprint and nanoprint principles are capable of producing ordered arrays of multilayer transition metal dichalcogenide microst...

Description complète

Enregistré dans:
Détails bibliographiques
Publié dans:Microsyst Nanoeng
Auteurs principaux: Chen, Mikai, Rokni, Hossein, Lu, Wei, Liang, Xiaogan
Format: Artigo
Langue:Inglês
Publié: Nature Publishing Group 2017
Sujets:
Accès en ligne:https://ncbi.nlm.nih.gov/pmc/articles/PMC6444983/
https://ncbi.nlm.nih.gov/pubmed/31057879
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/micronano.2017.53
Tags: Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!