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Nanoimprint lithography for nanodevice fabrication
Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or...
Tallennettuna:
| Julkaisussa: | Nano Converg |
|---|---|
| Päätekijät: | , |
| Aineistotyyppi: | Artigo |
| Kieli: | Inglês |
| Julkaistu: |
Korea Nano Technology Research Society
2016
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| Aiheet: | |
| Linkit: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5271567/ https://ncbi.nlm.nih.gov/pubmed/28191431 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s40580-016-0081-y |
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