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Nanoimprint lithography for nanodevice fabrication

Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or...

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Bibliografiska uppgifter
I publikationen:Nano Converg
Huvudupphovsmän: Barcelo, Steven, Li, Zhiyong
Materialtyp: Artigo
Språk:Inglês
Publicerad: Korea Nano Technology Research Society 2016
Ämnen:
Länkar:https://ncbi.nlm.nih.gov/pmc/articles/PMC5271567/
https://ncbi.nlm.nih.gov/pubmed/28191431
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s40580-016-0081-y
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