Chen, M., Rokni, H., Lu, W., & Liang, X. (2017). Scaling behavior of nanoimprint and nanoprinting lithography for producing nanostructures of molybdenum disulfide. Microsyst Nanoeng.
Citação norma ChicagoChen, Mikai, Hossein Rokni, Wei Lu, and Xiaogan Liang. "Scaling Behavior of Nanoimprint and Nanoprinting Lithography for Producing Nanostructures of Molybdenum Disulfide." Microsyst Nanoeng 2017.
MLA CitationChen, Mikai, Hossein Rokni, Wei Lu, and Xiaogan Liang. "Scaling Behavior of Nanoimprint and Nanoprinting Lithography for Producing Nanostructures of Molybdenum Disulfide." Microsyst Nanoeng 2017.
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