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Scaling behavior of nanoimprint and nanoprinting lithography for producing nanostructures of molybdenum disulfide
Top-down lithography techniques are needed for manufacturing uniform device structures based on emerging 2D-layered materials. Mechanical exfoliation approaches based on nanoimprint and nanoprint principles are capable of producing ordered arrays of multilayer transition metal dichalcogenide microst...
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| Publicado no: | Microsyst Nanoeng |
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| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Publishing Group
2017
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6444983/ https://ncbi.nlm.nih.gov/pubmed/31057879 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/micronano.2017.53 |
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