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Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography
This paper attempts to compare the main features of random and highly ordered gold nanostructure arrays (NSA) prepared by thermally annealed island film and nanoimprint lithography (NIL) techniques, respectively. Each substrate possesses different morphology in terms of plasmonic enhancement. Both m...
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| Publicado no: | Nanoscale Res Lett |
|---|---|
| Main Authors: | , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer US
2015
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4385248/ https://ncbi.nlm.nih.gov/pubmed/25852395 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-015-0819-1 |
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