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Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography
This paper attempts to compare the main features of random and highly ordered gold nanostructure arrays (NSA) prepared by thermally annealed island film and nanoimprint lithography (NIL) techniques, respectively. Each substrate possesses different morphology in terms of plasmonic enhancement. Both m...
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| 出版年: | Nanoscale Res Lett |
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| 主要な著者: | , , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Springer US
2015
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4385248/ https://ncbi.nlm.nih.gov/pubmed/25852395 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-015-0819-1 |
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