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One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based...
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| Udgivet i: | Nanoscale Res Lett |
|---|---|
| Main Authors: | , , , , , |
| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
Springer US
2018
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| Fag: | |
| Online adgang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6281547/ https://ncbi.nlm.nih.gov/pubmed/30519820 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-018-2817-6 |
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