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One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based...
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| Publicado no: | Nanoscale Res Lett |
|---|---|
| Main Authors: | , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer US
2018
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6281547/ https://ncbi.nlm.nih.gov/pubmed/30519820 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-018-2817-6 |
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