Tan, X., Shi, T., Lin, J., Sun, B., Tang, Z., & Liao, G. (2018). One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures. Nanoscale Res Lett.
Styl ChicagoTan, Xianhua, Tielin Shi, Jianbin Lin, Bo Sun, Zirong Tang, a Guanglan Liao. "One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures." Nanoscale Res Lett 2018.
Citace podle MLATan, Xianhua, et al. "One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures." Nanoscale Res Lett 2018.
Upozornění: Tyto citace jsou generovány automaticky. Nemusí být zcela správně podle citačních pravidel..