טוען...
One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based...
שמור ב:
| הוצא לאור ב: | Nanoscale Res Lett |
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| Main Authors: | , , , , , |
| פורמט: | Artigo |
| שפה: | Inglês |
| יצא לאור: |
Springer US
2018
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| נושאים: | |
| גישה מקוונת: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6281547/ https://ncbi.nlm.nih.gov/pubmed/30519820 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-018-2817-6 |
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