Atomic layer deposition and properties of ZrO(2)/Fe(2)O(3) thin films

Thin solid films consisting of ZrO(2) and Fe(2)O(3) were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO(2) were stabilized by Fe(2)O(3) doping. The number of alternating ZrO(2) and Fe(2)O(3) deposition cycles were varied in order to achieve films with different cation rat...

Descrizione completa

Salvato in:
Dettagli Bibliografici
Pubblicato in:Beilstein J Nanotechnol
Autori principali: Kalam, Kristjan, Seemen, Helina, Ritslaid, Peeter, Rähn, Mihkel, Tamm, Aile, Kukli, Kaupo, Kasikov, Aarne, Link, Joosep, Stern, Raivo, Dueñas, Salvador, Castán, Helena, García, Héctor
Natura: Artigo
Lingua:Inglês
Pubblicazione: Beilstein-Institut 2018
Soggetti:
Full Research Paper
Accesso online:https://ncbi.nlm.nih.gov/pmc/articles/PMC5789441/
https://ncbi.nlm.nih.gov/pubmed/29441257
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.9.14
Tags: Aggiungi Tag
Nessun Tag, puoi essere il primo ad aggiungerne! !

Documenti analoghi