Atomic layer deposition and properties of ZrO(2)/Fe(2)O(3) thin films

Thin solid films consisting of ZrO(2) and Fe(2)O(3) were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO(2) were stabilized by Fe(2)O(3) doping. The number of alternating ZrO(2) and Fe(2)O(3) deposition cycles were varied in order to achieve films with different cation rat...

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Detalhes bibliográficos
Publicado no:Beilstein J Nanotechnol
Main Authors: Kalam, Kristjan, Seemen, Helina, Ritslaid, Peeter, Rähn, Mihkel, Tamm, Aile, Kukli, Kaupo, Kasikov, Aarne, Link, Joosep, Stern, Raivo, Dueñas, Salvador, Castán, Helena, García, Héctor
Formato: Artigo
Idioma:Inglês
Publicado em: Beilstein-Institut 2018
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Full Research Paper
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5789441/
https://ncbi.nlm.nih.gov/pubmed/29441257
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.9.14
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