Atomic layer deposition and properties of ZrO(2)/Fe(2)O(3) thin films

Thin solid films consisting of ZrO(2) and Fe(2)O(3) were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO(2) were stabilized by Fe(2)O(3) doping. The number of alternating ZrO(2) and Fe(2)O(3) deposition cycles were varied in order to achieve films with different cation rat...

Täydet tiedot

Tallennettuna:
Bibliografiset tiedot
Julkaisussa:Beilstein J Nanotechnol
Päätekijät: Kalam, Kristjan, Seemen, Helina, Ritslaid, Peeter, Rähn, Mihkel, Tamm, Aile, Kukli, Kaupo, Kasikov, Aarne, Link, Joosep, Stern, Raivo, Dueñas, Salvador, Castán, Helena, García, Héctor
Aineistotyyppi: Artigo
Kieli:Inglês
Julkaistu: Beilstein-Institut 2018
Aiheet:
Full Research Paper
Linkit:https://ncbi.nlm.nih.gov/pmc/articles/PMC5789441/
https://ncbi.nlm.nih.gov/pubmed/29441257
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.9.14
Tagit: Lisää tagi
Ei tageja, Lisää ensimmäinen tagi!

Samankaltaisia teoksia