Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films

[Image: see text] Mixed films of a high-permittivity oxide, Er(2)O(3), and a magnetic material, Fe(2)O(3), were grown by atomic layer deposition on silicon and titanium nitride at 375 °C using erbium diketonate, ferrocene, and ozone as precursors. Crystalline phases of erbium and iron oxides were fo...

ver descrição completa

Na minha lista:
Detalhes bibliográficos
Publicado no:ACS Omega
Main Authors: Tamm, Aile, Kalam, Kristjan, Seemen, Helina, Kozlova, Jekaterina, Kukli, Kaupo, Aarik, Jaan, Link, Joosep, Stern, Raivo, Dueñas, Salvador, Castán, Helena
Formato: Artigo
Idioma:Inglês
Publicado em: American Chemical Society 2017
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC6645657/
https://ncbi.nlm.nih.gov/pubmed/31457414
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsomega.7b01394
Tags: Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!

Registos relacionados