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Microwave evaluation of electromigration susceptibility in advanced interconnects
Traditional metrology has been unable to adequately address the needs of the emerging integrated circuits (ICs) at the nano scale; thus, new metrology and techniques are needed. For example, the reliability challenges in fabrication need to be well understood and controlled to facilitate mass produc...
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| Udgivet i: | J Appl Phys |
|---|---|
| Main Authors: | , , , |
| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
2017
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| Fag: | |
| Online adgang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5761678/ https://ncbi.nlm.nih.gov/pubmed/29332950 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1063/1.4992135 |
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