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Microwave evaluation of electromigration susceptibility in advanced interconnects

Traditional metrology has been unable to adequately address the needs of the emerging integrated circuits (ICs) at the nano scale; thus, new metrology and techniques are needed. For example, the reliability challenges in fabrication need to be well understood and controlled to facilitate mass produc...

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Detalhes bibliográficos
Publicado no:J Appl Phys
Main Authors: Sunday, Christopher E., Veksler, Dmitry, Cheung, Kin C., Obeng, Yaw S.
Formato: Artigo
Idioma:Inglês
Publicado em: 2017
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5761678/
https://ncbi.nlm.nih.gov/pubmed/29332950
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1063/1.4992135
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