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Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique
In this study we used the commercial 0.35 μm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide...
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| Autori principali: | , , , |
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| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
Molecular Diversity Preservation International (MDPI)
2009
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| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3312440/ https://ncbi.nlm.nih.gov/pubmed/22454581 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/s90806219 |
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