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Manufacture and Characterization of High Q-Factor Inductors Based on CMOS-MEMS Techniques
A high Q-factor (quality-factor) spiral inductor fabricated by the CMOS (complementary metal oxide semiconductor) process and a post-process was investigated. The spiral inductor is manufactured on a silicon substrate. A post-process is used to remove the underlying silicon substrate in order to red...
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| Hauptverfasser: | , , |
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| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Molecular Diversity Preservation International (MDPI)
2011
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3231288/ https://ncbi.nlm.nih.gov/pubmed/22163726 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/s111009798 |
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