Role of the Oxidation State in Cobalt Chemical Mechanical Planarization

ABSTRACT Cobalt (Co) is a promising next‐generation contact metal to replace tungsten for the system‐large‐scale integration devices beyond the 5 nm technology node due to its low resistivity and high gap‐filling capability at high aspect ratios. To complete Co metallization, surface roughness contr...

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Hlavní autoři:	Ganggyu Lee, Yehwan Kim, Myungju Woo, Sumin Hong, Hongjun Park, Giha Lee, Taeseup Song, Ungyu Paik
Médium:	Artigo
Jazyk:	Inglês
Vydáno:	Wiley 2025-12-01
Edice:	MetalMat
Témata:	CMP cobalt electronic materials oxidation behavior potassium periodate potentiostatic
On-line přístup:	https://doi.org/10.1002/metm.70014
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