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Role of the Oxidation State in Cobalt Chemical Mechanical Planarization

ABSTRACT Cobalt (Co) is a promising next‐generation contact metal to replace tungsten for the system‐large‐scale integration devices beyond the 5 nm technology node due to its low resistivity and high gap‐filling capability at high aspect ratios. To complete Co metallization, surface roughness contr...

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Principais autores: Ganggyu Lee, Yehwan Kim, Myungju Woo, Sumin Hong, Hongjun Park, Giha Lee, Taeseup Song, Ungyu Paik
Format: Artigo
Sprog:Inglês
Udgivet: Wiley 2025-12-01
Serier:MetalMat
Fag:
CMP
cobalt
electronic materials
oxidation behavior
potassium periodate
potentiostatic
Online adgang:https://doi.org/10.1002/metm.70014
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