Characterization of optical and structural properties of GaAsN layers grown by Molecular Beam Epitaxy
GaAsN layers were grown on GaAs(100) substrates by MBE employing a radio frequency (RF) plasma nitrogen source, and solid sources for Ga and As. The growth temperature was varied from 420 to 600 °C, and the GaAsN growth mode was in-situ monitored by reflection high-energy electron diffraction (RHEED...
Guardat en:
| Publicat a: | Superficies y vacío |
|---|---|
| Autors principals: | , , , , , , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
2005
|
| Matèries: | |
| Accés en línia: | https://www.redalyc.org/articulo.oa?id=94218307 |
| Etiquetes: |
Sense etiquetes, Sigues el primer a etiquetar aquest registre!
|
