DC sputtered Tin oxide films. Plasma parameters, composition and structure
Tin oxide films were growth by DC sputtering in oxygen plasma in the constant current mode. Films were growth atdifferent substrate temperatures, cathode currents and oxygen pressures, and they were characterized by x-raydiffraction and x-ray photoelectron spectroscopy. The cathode voltage was monit...
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| Publicat a: | Superficies y vacío |
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| Autors principals: | , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
2004
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| Matèries: | |
| Accés en línia: | https://www.redalyc.org/articulo.oa?id=94217401 |
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