Growth and characterization of Ge1-xSnx alloys grown by magnetron sputter deposition

Single phase Ge1-xSnx alloys have been grown on Ge(100) and GaAs(100) substrates using a R. F. Sputtering system.Using HRXRD on asymmetrical planes in plane and in growth lattice parameters are obtained. A residual strain due to thedifferences in the linear thermal expansion coefficient between the...

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Shranjeno v:
Bibliografske podrobnosti
izdano v:Superficies y vacío
Main Authors: H. Pérez Ladrón de Guevara, H. Navarro Contreras, M. A. Vidal
Format: Artigo
Jezik:Inglês
Izdano: Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 2003
Teme:
Física, Astronomía y Matemáticas
Ge1
HRXRD
xSnx alloys
Sputtering deposition
Online dostop:https://www.redalyc.org/articulo.oa?id=94216405
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