Transparent conducting zinc-co-doped ITO films prepared by magnetron sputtering
Zn-co-doped ITO films have been prepared by dc magnetron sputtering using powder targets. Zn-co-doped ITO films with a practical etching rate as well as a low resistivity were obtained; in particular, etching rate could be controlled by varying the Zn content doped into ITO. In addition, a resistivi...
I tiakina i:
| I whakaputaina i: | Superficies y vacío |
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| Ngā kaituhi matua: | , , , |
| Hōputu: | Artigo |
| Reo: | Inglês |
| I whakaputaina: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| Ngā marau: | |
| Urunga tuihono: | https://www.redalyc.org/articulo.oa?id=94200917 |
| Ngā Tūtohu: |
Kāore He Tūtohu, Me noho koe te mea tuatahi ki te tūtohu i tēnei pūkete!
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