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Characterization of ALN thin films deposited by DC reactive magnetron sputtering

A set of AlN thin-films was prepared by reactive magnetron sputtering at room temperature. The purpose of this work was to study the effect of oxygen impurities on the structural and optical properties of AlN films. The structural and optical properties of the resulting films were characterized usin...

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Publicado no:Revista Mexicana de Física
Main Authors: M. García-Méndez, S. Morales-Rodríguez, R. Machorro, W. De La Cruz
Formato: Artigo
Idioma:Inglês
Publicado em: Sociedad Mexicana de Física A.C. 2008
Assuntos:
AlN
Acesso em linha:https://www.redalyc.org/articulo.oa?id=57016047002
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