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Characterization of ALN thin films deposited by DC reactive magnetron sputtering

A set of AlN thin-films was prepared by reactive magnetron sputtering at room temperature. The purpose of this work was to study the effect of oxygen impurities on the structural and optical properties of AlN films. The structural and optical properties of the resulting films were characterized usin...

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Enregistré dans:
Détails bibliographiques
Publié dans:Revista Mexicana de Física
Auteurs principaux: M. García-Méndez, S. Morales-Rodríguez, R. Machorro, W. De La Cruz
Format: Artigo
Langue:Inglês
Publié: Sociedad Mexicana de Física A.C. 2008
Sujets:
AlN
Accès en ligne:https://www.redalyc.org/articulo.oa?id=57016047002
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