Characterization of ALN thin films deposited by DC reactive magnetron sputtering
A set of AlN thin-films was prepared by reactive magnetron sputtering at room temperature. The purpose of this work was to study the effect of oxygen impurities on the structural and optical properties of AlN films. The structural and optical properties of the resulting films were characterized usin...
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| Опубликовано в:: | Revista Mexicana de Física |
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| Главные авторы: | , , , |
| Формат: | Artigo |
| Язык: | Inglês |
| Опубликовано: |
Sociedad Mexicana de Física A.C.
2008
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| Предметы: | |
| Online-ссылка: | https://www.redalyc.org/articulo.oa?id=57016047002 |
| Метки: |
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