Cu4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target
Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by...
Gorde:
| Argitaratua izan da: | Revista Mexicana de Física |
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| Egile Nagusiak: | , , , , , , |
| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
Sociedad Mexicana de Física A.C.
2021
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| Gaiak: | |
| Sarrera elektronikoa: | https://www.redalyc.org/articulo.oa?id=57082948018 |
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