Cu4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target

Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by...

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Библиографические подробности

Опубликовано в::	Revista Mexicana de Física
Главные авторы:	M. A Cruz Almazan, E Vigueras Santiago, R Lopez, S Hernandez Lopez, V. Hugo Castrejon Sanchez, A Esparza, C Encarnacion Gomez
Формат:	Artigo
Язык:	Inglês
Опубликовано:	Sociedad Mexicana de Física A.C. 2021
Предметы:	Física, Astronomía y Matemáticas
Online-ссылка:	https://www.redalyc.org/articulo.oa?id=57082948018
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