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Optical properties, infrared spectroscopy and photoluminescence at low temperature of LPCVD silicon oxynitride thin films
Low pressure chemical vapor deposition (LPCVD) silicon oxynitride (SiON) films of various compositions between SiO2 and Si3N4 were grown by changing the relative ratio (Ro) of nitrous oxide (N2O) to silane (SiH4) pressures while keeping constant the ammonia (NH4) pressure. The SiON films were deposi...
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| 出版年: | Superficies y vacío |
|---|---|
| 主要な著者: | , , , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| 主題: | |
| オンライン･アクセス: | https://www.redalyc.org/articulo.oa?id=94200914 |
| タグ: |
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