Optical properties, infrared spectroscopy and photoluminescence at low temperature of LPCVD silicon oxynitride thin films

Low pressure chemical vapor deposition (LPCVD) silicon oxynitride (SiON) films of various compositions between SiO2 and Si3N4 were grown by changing the relative ratio (Ro) of nitrous oxide (N2O) to silane (SiH4) pressures while keeping constant the ammonia (NH4) pressure. The SiON films were deposi...

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Xehetasun bibliografikoak

Argitaratua izan da:	Superficies y vacío
Egile Nagusiak:	Wilfrido Calleja, Elvia Díaz, Concepción Mejía, Arturo Morales, Jesús Carrillo, Mariano Aceves, Gerardo Contreras
Formatua:	Artigo
Hizkuntza:	Inglês
Argitaratua:	Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 1999
Gaiak:	Física, Astronomía y Matemáticas
Sarrera elektronikoa:	https://www.redalyc.org/articulo.oa?id=94200914
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