Optical properties, infrared spectroscopy and photoluminescence at low temperature of LPCVD silicon oxynitride thin films

Low pressure chemical vapor deposition (LPCVD) silicon oxynitride (SiON) films of various compositions between SiO2 and Si3N4 were grown by changing the relative ratio (Ro) of nitrous oxide (N2O) to silane (SiH4) pressures while keeping constant the ammonia (NH4) pressure. The SiON films were deposi...

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Detalles Bibliográficos

Publicado en:	Superficies y vacío
Principais autores:	Wilfrido Calleja, Elvia Díaz, Concepción Mejía, Arturo Morales, Jesús Carrillo, Mariano Aceves, Gerardo Contreras
Formato:	Artigo
Idioma:	Inglês
Publicado:	Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 1999
Assuntos:	Física, Astronomía y Matemáticas
Acceso en liña:	https://www.redalyc.org/articulo.oa?id=94200914
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