Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on Silicon
The infrared analysis of thin films on a thick substrate is discussed using the example of plasma-deposited, amorphous, hydrogenated carbon layers (a-C:H) on silicon substrates. The framework for the optical analysis of thin films is presented. The main characteristic of thin film optics is the occu...
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| Veröffentlicht in: | Brazilian Journal of Physics |
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| Hauptverfasser: | , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Sociedade Brasileira de Física
2000
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| Schlagworte: | |
| Online-Zugang: | https://www.redalyc.org/articulo.oa?id=46413500006 |
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