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Infrared Analysis of Thin Films: Amorphous, Hydrogenated Carbon on Silicon

The infrared analysis of thin films on a thick substrate is discussed using the example of plasma-deposited, amorphous, hydrogenated carbon layers (a-C:H) on silicon substrates. The framework for the optical analysis of thin films is presented. The main characteristic of thin film optics is the occu...

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Bibliografske podrobnosti
izdano v:Brazilian Journal of Physics
Main Authors: Wolfgang Jacob, Achim von Keudell, Thomas Schwarz-Selinger
Format: Artigo
Jezik:Inglês
Izdano: Sociedade Brasileira de Física 2000
Teme:
Online dostop:https://www.redalyc.org/articulo.oa?id=46413500006
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