Electrical and Morphological Properties of Low Resistivity Mo thin Films Prepared by Magnetron Sputtering
Mo thin films have been deposited using a DC magnetron sputtering system with an S-gun configurationelectrode and characterized electrically and morphologically. The influence of the sputtering gas pressure andglow discharge (GD) power, on the electrical resistivity of Mo thin films and on the conta...
में बचाया:
| में प्रकाशित: | Brazilian Journal of Physics |
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| मुख्य लेखकों: | , , |
| स्वरूप: | Artigo |
| भाषा: | Inglês |
| प्रकाशित: |
Sociedade Brasileira de Física
2006
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| विषय: | |
| ऑनलाइन पहुंच: | https://www.redalyc.org/articulo.oa?id=46436549 |
| टैग: |
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