Electrical and Morphological Properties of Low Resistivity Mo thin Films Prepared by Magnetron Sputtering

Mo thin films have been deposited using a DC magnetron sputtering system with an S-gun configurationelectrode and characterized electrically and morphologically. The influence of the sputtering gas pressure andglow discharge (GD) power, on the electrical resistivity of Mo thin films and on the conta...

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Publicat a:Brazilian Journal of Physics
Autors principals: G. Gordillo, F. Mesa, C. Calderón
Format: Artigo
Idioma:Inglês
Publicat: Sociedade Brasileira de Física 2006
Matèries:
Física, Astronomía y Matemáticas
Mo
CIGS
Thin films
Solar cells
Low resistivity
Accés en línia:https://www.redalyc.org/articulo.oa?id=46436549
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