Electrical and Morphological Properties of Low Resistivity Mo thin Films Prepared by Magnetron Sputtering
Mo thin films have been deposited using a DC magnetron sputtering system with an S-gun configurationelectrode and characterized electrically and morphologically. The influence of the sputtering gas pressure andglow discharge (GD) power, on the electrical resistivity of Mo thin films and on the conta...
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| Udgivet i: | Brazilian Journal of Physics |
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| Principais autores: | , , |
| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
Sociedade Brasileira de Física
2006
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| Online adgang: | https://www.redalyc.org/articulo.oa?id=46436549 |
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