Electrical and Morphological Properties of Low Resistivity Mo thin Films Prepared by Magnetron Sputtering

Mo thin films have been deposited using a DC magnetron sputtering system with an S-gun configurationelectrode and characterized electrically and morphologically. The influence of the sputtering gas pressure andglow discharge (GD) power, on the electrical resistivity of Mo thin films and on the conta...

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Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Cyhoeddwyd yn:Brazilian Journal of Physics
Prif Awduron: G. Gordillo, F. Mesa, C. Calderón
Fformat: Artigo
Iaith:Inglês
Cyhoeddwyd: Sociedade Brasileira de Física 2006
Pynciau:
Física, Astronomía y Matemáticas
Mo
CIGS
Thin films
Solar cells
Low resistivity
Mynediad Ar-lein:https://www.redalyc.org/articulo.oa?id=46436549
Tagiau: Ychwanegu Tag
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