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Anisotropic silicon nanowire arrays fabricated by colloidal lithography
The combination of metal-assisted chemical etching (MACE) and colloidal lithography allows for the affordable, large-scale and high-throughput synthesis of silicon nanowire (SiNW) arrays. However, many geometric parameters of these arrays are coupled and cannot be addressed individually using colloi...
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| Publicat a: | Nanoscale Adv |
|---|---|
| Autors principals: | , , , , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
RSC
2021
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8204746/ https://ncbi.nlm.nih.gov/pubmed/34212129 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1039/d1na00259g |
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